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Parallel active cantilever AFM tool for high-throughput inspection and metrology
Author(s): Mathias Holz; Christoph Reuter; Ahmad Ahmad; Alexander Reum; Tzvetan Ivanov; Elshad Guliyev; Ivo W. Rangelow; Ho-Se Lee
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Paper Abstract

Atomic Force Microscopy (AFM) is a capable to provide high resolution CD-metrology and precise defects analysis on large wafers, masks or displays. However, AFM is not enough productive for high-throughput industrial uses. Standard single probe AFMs are showing low throughput as a serial imaging tools. The use of an array of four cantilevers as a Quattro-Array results in effective speed of 6 to 10 mm/s. An image size of 0.5mm x 0.2mm is achieved employing a piezoelectric positioner with a scan range of 200μm x 200μm and a resolution of 0.25nm (x,y) and 0.2nm (z), respectively. These capabilities are qualifying the Quattro-cantilever array system as fastest tool for. In this paper we present new results obtained with our Quattro-AFM high-throughput parallel SPM system that exhibits two key advances that are required for a successful deployment of SPM in time-efficient metrology, defect analysis and mask inspection.

Paper Details

Date Published: 26 March 2019
PDF: 6 pages
Proc. SPIE 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII, 1095929 (26 March 2019); doi: 10.1117/12.2515091
Show Author Affiliations
Mathias Holz, nano analytik GmbH (Germany)
Christoph Reuter, nano analytik GmbH (Germany)
Ahmad Ahmad, nano analytik GmbH (Germany)
Alexander Reum, nano analytik GmbH (Germany)
Tzvetan Ivanov, Ilmenau Univ. of Technology (Germany)
Elshad Guliyev, Ilmenau Univ. of Technology (Germany)
Ivo W. Rangelow, Ilmenau Univ. of Technology (Germany)
Ho-Se Lee, SEUM Tronics (Korea, Republic of)


Published in SPIE Proceedings Vol. 10959:
Metrology, Inspection, and Process Control for Microlithography XXXIII
Vladimir A. Ukraintsev; Ofer Adan, Editor(s)

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