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High-precision MoSi multilayer coatings at high-volume for continued EUVL infrastructure development
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Paper Abstract

The development of industrial infrastructure for EUV lithography requires a wide array of optics beyond the mask and the scanner optics, which include optics for critical instruments such as actinic inspection optics or in-situ diffusers. This paper will detail recent results in the production of high-precision multilayer coatings achieved to support this development. In the first case, a range of imaging optics with multiple sizes and radial designs are all produced in a cyclic fashion on a single high-volume machine. Optics feature a diameter from a few millimeters to over 200mm, as well as a range of curvatures, on high-capacity machine in which four different optics were efficiently calibrated and coated in parallel. Details relating to results of precision, repeatability, and added surface distortion are highlighted. In the second case, the contribution to developing a diffusing multilayer by using sputter deposition to first create a tuned irregular surface is described. This diffusive EUV surface is a critical component for an in-situ EUV scanner wavefront metrology system based on lateral shearing interferometry. Details will be shared on the use of Cr as a thin film that can be deposited to meet process requirements for the tuned parameters of surface roughness required to reduce the reflective specular component and the spatial frequency spectrum of the roughness to fully fill the pupil without excessive overfill leading to loss of light.

Paper Details

Date Published: 26 March 2019
PDF: 9 pages
Proc. SPIE 10957, Extreme Ultraviolet (EUV) Lithography X, 109571I (26 March 2019); doi: 10.1117/12.2514989
Show Author Affiliations
Michael Kriese, Rigaku Innovative Technologies, Inc. (United States)
Yang Li, Rigaku Innovative Technologies, Inc. (United States)
Jeffery Steele, Rigaku Innovative Technologies, Inc. (United States)
Yuriy Platonov, Rigaku Innovative Technologies, Inc. (United States)


Published in SPIE Proceedings Vol. 10957:
Extreme Ultraviolet (EUV) Lithography X
Kenneth A. Goldberg, Editor(s)

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