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An exploration of the use of fluoropolymers in photofiltration
Author(s): A. Wu; A. Xia
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Paper Abstract

Advanced lithography techniques relying on innovations in scanner, track, and material technologies have been a consistent driver of Moore’s Law. As these innovations transition from laboratories to factories, all members of the lithography value chain must adapt. Filtration technology has relied upon a subset of carefully matched materials to filter lithographic materials. The introduction of new materials for emerging lithography techniques creates the opportunity to seek alternatives to ultra-high molecular weight polyethylene (UPE), Nylon, and polypropylene.

Fluoropolymers, such as polytetrafluoroethylene (PTFE) and perfluoroalkoxy alkane (PFA), have been used widely in the fab to filter chemistries that require instant surface wettability and high flow rates. These requirements now align more closely with today’s leading-edge lithography materials. After a review of the motivation behind choosing new filtration materials in the lithography sector, this paper will identify the critical material attributes, specific design considerations, and the importance of membrane surface technologies, beginning in the photoresist manufacturing process. Data presented will include laboratory studies of fluoropolymer membranes in common solvents, on-wafer defect data, and bulk filtration manufacturing data, all showing the match between fluoropolymer filters and photolithography materials.

Paper Details

Date Published: 25 March 2019
PDF: 6 pages
Proc. SPIE 10960, Advances in Patterning Materials and Processes XXXVI, 109601U (25 March 2019); doi: 10.1117/12.2514958
Show Author Affiliations
A. Wu, Entegris, Inc. (United States)
A. Xia, Entegris, Inc. (United States)


Published in SPIE Proceedings Vol. 10960:
Advances in Patterning Materials and Processes XXXVI
Roel Gronheid; Daniel P. Sanders, Editor(s)

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