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YieldStar uDBO overlay metrology in Samsung D1y DRAM volume production
Author(s): Jang-Sun Kim; Jin-Moo Byun; Remco Lancee; Jong-Hyun Hwang; Hyeon-Jun Ha; Kwang-Young Hu; Se-Ra Jeon; Won-Jae Jang; Hyung-Sub Son; Vidar van der Meijden; Marc Noot; Bartosz Foltynski; Lukasz Macht; Grzegorz Grzela; Cedric Grouwstra
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Paper Abstract

To produce high-yielding wafers, overlay control in DRAM production needs to be exceptionally tight. The ASML YieldStar 375F introduces a continuous wavelength source and dual wavelength operation to deliver the high measurement accuracy and robustness required as input to the overlay control loop. At the same time, the high throughput required to allow high sampling densities is maintained. The YieldStar 375 was evaluated and adopted for Samsung’s D1y DRAM node.

Paper Details

Date Published: 26 March 2019
PDF: 7 pages
Proc. SPIE 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII, 109592M (26 March 2019); doi: 10.1117/12.2514931
Show Author Affiliations
Jang-Sun Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Jin-Moo Byun, ASML Korea (Korea, Republic of)
Remco Lancee, ASML Netherlands (Netherlands)
Jong-Hyun Hwang, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Hyeon-Jun Ha, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Kwang-Young Hu, ASML Korea (Korea, Republic of)
Se-Ra Jeon, ASML Netherlands (Netherlands)
Won-Jae Jang, ASML Korea (Korea, Republic of)
Hyung-Sub Son, ASML Korea (Korea, Republic of)
Vidar van der Meijden, ASML Netherlands (Netherlands)
Marc Noot, ASML Netherlands (Netherlands)
Bartosz Foltynski, ASML Netherlands B.V. (Netherlands)
Lukasz Macht, ASML Netherlands (Netherlands)
Grzegorz Grzela, ASML Netherlands (Netherlands)
Cedric Grouwstra, ASML Netherlands (Netherlands)


Published in SPIE Proceedings Vol. 10959:
Metrology, Inspection, and Process Control for Microlithography XXXIII
Vladimir A. Ukraintsev; Ofer Adan, Editor(s)

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