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Imaging behavior of highly fluorinated molecular resists under extreme UV radiation
Author(s): Hyuntaek Oh; Seok-Heon Jung; Jeong-Seok Mun; Kanghyun Kim; Sangsul Lee; Jin-Kyun Lee
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Paper Abstract

We propose a concept of organic small molecule-based EUV resists that do not require sub-stoichiometric ingredients. Based on our previous results with highly fluorinated electron-beam (e-beam) resists, we designed amorphous small molecules equipped with perfluoroalkyl ether (PFAE) chains. The synthesis of the prototype was carried out successfully, and its physical properties, imaging mechanism, and performance were all evaluated under e-beam exposure conditions. Although the prototype showed slightly low sensitivity to EUV irradiation, we were able to mitigate the issue by appending other cross-linkable functional moieties. The modified version showed decent negative-tone patterning performance under e-beam exposure and could form images under EUV irradiation and the pattern development step using highly fluorinated solvents.

Paper Details

Date Published: 25 March 2019
PDF: 7 pages
Proc. SPIE 10960, Advances in Patterning Materials and Processes XXXVI, 1096012 (25 March 2019); doi: 10.1117/12.2514928
Show Author Affiliations
Hyuntaek Oh, Inha Univ. (Korea, Republic of)
Seok-Heon Jung, Cornell Univ. (United States)
Jeong-Seok Mun, Inha Univ. (Korea, Republic of)
Kanghyun Kim, Pohang Accelerator Lab. (Korea, Republic of)
Sangsul Lee, Pohang Accelerator Lab. (Korea, Republic of)
Jin-Kyun Lee, Inha Univ. (Korea, Republic of)


Published in SPIE Proceedings Vol. 10960:
Advances in Patterning Materials and Processes XXXVI
Roel Gronheid; Daniel P. Sanders, Editor(s)

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