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Blazed x-ray reflection gratings using electron-beam lithography and ion milling (Conference Presentation)
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Paper Abstract

Astronomical X-ray diffraction gratings are a key technology under development for current and future NASA missions. X-ray reflection gratings, developed at Penn State University, have recently demonstrated both leading diffraction efficiency and high spectral resolving power. However, recent results are the result of different fabrication techniques and a single technique has not yet been developed to yield a grating that satisfies both the diffraction efficiency and resolving power required by future missions. Here we seek to leverage exiting electron-beam lithographic techniques to produce a grating with groove groove pattern capable of high resolving power. We then introduce new ion-milling techniques to create custom groove profiles capable of high diffraction efficiency. The goal is to produce a radial groove pattern with precisely blazed facets that are customizable based on ion mill input parameters. The process should be insensitive to groove density (ranging from ~150 nm to 400+ nm), facet size, and desired facet angle. Initial efforts in this study have concentrated on constraining various parameters in ion milling to fully characterize the effect of each parameter on the grating groove profile. We present here initial results and discuss experimental verification and future work.

Paper Details

Date Published: 18 March 2019
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Proc. SPIE 10963, Advanced Etch Technology for Nanopatterning VIII, 109630U (18 March 2019); doi: 10.1117/12.2514857
Show Author Affiliations
Drew M. Miles, The Pennsylvania State Univ. (United States)
Randall L. McEntaffer, The Pennsylvania State Univ. (United States)
Fabien Grise, The Pennsylvania State Univ. (United States)
Chad Eichfeld, The Pennsylvania State Univ. (United States)
Ross McCurdy, The Pennsylvania State Univ. (United States)


Published in SPIE Proceedings Vol. 10963:
Advanced Etch Technology for Nanopatterning VIII
Richard S. Wise; Catherine B. Labelle, Editor(s)

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