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Design for manufacturability for analog, radio frequency, and millimeter wave designs
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Paper Abstract

A suite of DFM enablement is enhanced to address the unique needs of analog, RF, and mmWave designs in the custom design flow. The DFM rules and patterns are made stricter beyond baseline requirements, and new DFM rules and patterns are added to further reduce layout-dependent device variability. Auto-fixing in the custom design flow is enhanced to meet these new requirements. New DFM enablement is developed for device matching for differential circuits and sensitive devices. Lastly, novel DFM fill strategies are implemented to reduce the variability of passive devices operating at high frequencies. Using DFM-aware fill, a 2% quality-factor loss for a mmWave inductor operating at 30 GHz is shown to be sufficient for meeting manufacturing planarity requirements.

Paper Details

Date Published: 20 March 2019
PDF: 9 pages
Proc. SPIE 10962, Design-Process-Technology Co-optimization for Manufacturability XIII, 109620G (20 March 2019); doi: 10.1117/12.2514769
Show Author Affiliations
Lynn Wang, GLOBALFOUNDRIES Inc. (United States)
Gail Katzman, GLOBALFOUNDRIES Inc. (United States)
Yongfu Li, GLOBALFOUNDRIES Inc. (United States)
Vikas Mehrotra, GLOBALFOUNDRIES Inc. (United States)
Janam Bakshi, GLOBALFOUNDRIES Inc. (United States)
Ahmed Abdulghany, GLOBALFOUNDRIES Inc. (United States)
Michael Simcoe, GLOBALFOUNDRIES Inc. (United States)
Rais Huda, GLOBALFOUNDRIES Inc. (United States)
Zhao Chuan Lee, GLOBALFOUNDRIES Singapore Pte. Ltd. (United States)
Don Blackwell, GLOBALFOUNDRIES Inc. (United States)
Thomas Hermann, GLOBALFOUNDRIES Inc. (United States)
Uwe Paul Schroeder, GLOBALFOUNDRIES Inc. (United States)
Thomas McKay, GLOBALFOUNDRIES Inc. (United States)
Sriram Madhavan, GLOBALFOUNDRIES Inc. (United States)


Published in SPIE Proceedings Vol. 10962:
Design-Process-Technology Co-optimization for Manufacturability XIII
Jason P. Cain, Editor(s)

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