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Software in semiconductor manufacturing: peripeteias and prospects (Conference Presentation)
Author(s): Yuri Granik

Paper Abstract

We explore role of software modeling in semiconductor manufacturing and contrast it with the roles that modeling plays in other fields of human activity. Major trends and challenges in physical and compact process modeling are discussed. We contemplate complexities arising from their multi-dimensional nature. The landscape of Optical Proximity Correction and satellite applications is surveyed. Instructive examples are collected that demonstrate shortcomings of our intuition while dealing with complex systems and parameter interactions. We ponder over the scientific and business opportunities of new promising techniques and prospective applications.

Paper Details

Date Published: 18 March 2019
PDF
Proc. SPIE 10961, Optical Microlithography XXXII, 1096103 (18 March 2019); doi: 10.1117/12.2514761
Show Author Affiliations
Yuri Granik, Mentor, a Siemens Business (United States)


Published in SPIE Proceedings Vol. 10961:
Optical Microlithography XXXII
Jongwook Kye; Soichi Owa, Editor(s)

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