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Laser-induced modification of local refractive index in infrared glass-ceramic films
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Paper Abstract

The ability to employ spatially-selective control of refractive index and dispersion variation with a high magnitude of change is essential for the realization of functional infrared graded-index (GRIN) components. Thin films fabricated from multi-component GAP-Se glass-ceramic materials were processed using nanosecond laser radiation at the wavelength λ = 2 μm. Various irradiation and post-processing protocols were implemented to maximize the magnitude of the local refractive index change, and to quantify the evolution of the glass to glass ceramic ‘conversion’ on optical material physical properties. Irradiation of films possessing various thicknesses from 1 to 25 μm was performed using area-scan patterns, while the average laser power and the number of scans were varied. Irradiated materials were subsequently heat-treated, and the local refractive index was determined for different durations of the heat treatment. Depth-dependent composition and film morphology characterization of as-deposited films was evaluated, and surface morphology of the post laserprocessed and heat-treated areas was studied to evaluate effects on the photo-thermal refractive index change associated with nanocrystal formation. Initial studies demonstrated a maximum positive refractive index change of ▵n ≈ 0.07 in a broad spectral range in the infrared which scales with film thickness and exposure dose while maintaining required optical quality.

Paper Details

Date Published: 4 March 2019
PDF: 7 pages
Proc. SPIE 10906, Laser-based Micro- and Nanoprocessing XIII, 109060X (4 March 2019); doi: 10.1117/12.2513462
Show Author Affiliations
Ilya Mingareev, Florida Institute of Technology (United States)
Myungkoo Kang, CREOL, The College of Optics and Photonics, Univ. of Central Florida (United States)
Teodor Malendevych, CREOL, The College of Optics and Photonics, Univ. of Central Florida (United States)
Gufan Yin, Massachusetts Institute of Technology (United States)
Juejun Hu, Massachusetts Institute of Technology (United States)
Kathleen Richardson, CREOL, The College of Optics and Photonics, Univ. of Central Florida (United States)
Martin Richardson, CREOL, The College of Optics and Photonics, Univ. of Central Florida (United States)


Published in SPIE Proceedings Vol. 10906:
Laser-based Micro- and Nanoprocessing XIII
Udo Klotzbach; Akira Watanabe; Rainer Kling, Editor(s)

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