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Remote plasma chemical vapour deposition of group III-nitride tunnel junctions for LED applications
Author(s): S. Barik; D. Liu; J. D. Brown; M. Wintrebert-Fouquet; A. J. Fernandes; P. P. -T. Chen; Q. Gao; V. Chan; I. Mann
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Paper Abstract

The low growth temperature technology Remote Plasma Chemical Vapour Deposition (RPCVD) is currently being developed by BluGlass Ltd. for use in high-brightness LED applications. The unique growth conditions of RPCVD are demonstrated to produce Activated As-Grown (AAG) buried p-GaN for achieving GaN-based tunnel junctions (TJ) for use in current spreading and potential use in cascade LED and LD applications. Hybrid RPCVD/MOCVD TJs were grown on commercial full blue LEDs, and all-RPCVD TJs were grown on commercial partially completed blue LEDs and the devices were processed into 1.1 mm x 1.1mm chips. The LEDs with hybrid TJ displayed a 4.4% increase in light output power (LOP) and an increase in forward voltage (Vf) of 0.68 V compared to LEDs using indium-tin oxide (ITO) at a current density of 26 A/cm2 . The LEDs with all-RPCVD TJs displayed a 3.6% increase in LOP and an increase in Vf of 0.88 V at 26 A/cm2 .

Paper Details

Date Published: 1 March 2019
PDF: 8 pages
Proc. SPIE 10940, Light-Emitting Devices, Materials, and Applications, 1094018 (1 March 2019); doi: 10.1117/12.2513261
Show Author Affiliations
S. Barik, BluGlass, Ltd. (Australia)
D. Liu, BluGlass, Ltd. (Australia)
J. D. Brown, BluGlass, Ltd. (Australia)
M. Wintrebert-Fouquet, BluGlass, Ltd. (Australia)
A. J. Fernandes, BluGlass, Ltd. (Australia)
P. P. -T. Chen, BluGlass, Ltd. (Australia)
Q. Gao, BluGlass, Ltd. (Australia)
V. Chan, BluGlass, Ltd. (Australia)
I. Mann, BluGlass, Ltd. (Australia)


Published in SPIE Proceedings Vol. 10940:
Light-Emitting Devices, Materials, and Applications
Jong Kyu Kim; Michael R. Krames; Martin Strassburg, Editor(s)

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