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Spectroscopic reflectometry in the extreme ultraviolet for critical dimension metrology
Author(s): Lukas Bahrenberg; Serhiy Danylyuk; Robert Michels; Sven Glabisch; Moein Ghafoori; Sascha Brose; Jochen Stollenwerk; Peter Loosen
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Paper Abstract

The authors report on critical dimension metrology on nanoscale gratings by means of laboratory-based spectroscopic reflectometry in the extreme ultraviolet (EUV). EUV reflectivity spectra of nanoscale gratings under grazing incidence illumination and their dependency on the geometrical grating parameters are discussed. A laboratory-based setup to measure such spectra is introduced and its main features are presented. A nanoscale grating with a grating period below 100 nm, consisting of multiple nanometer-size layers of materials, is experimentally investigated in the setup. The experimental results are consequently compared to a rigorous model fit of the reflectivity and thus the ability to model the grating’s interaction with EUV radiation is shown.

Paper Details

Date Published: 26 March 2019
PDF: 6 pages
Proc. SPIE 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII, 109591X (26 March 2019); doi: 10.1117/12.2513173
Show Author Affiliations
Lukas Bahrenberg, RWTH Aachen Univ. (Germany)
Serhiy Danylyuk, RWTH Aachen Univ. (Germany)
Robert Michels, Fraunhofer ILT- Institute for Laser Technology (Germany)
Sven Glabisch, RWTH Aachen Univ. (Germany)
Moein Ghafoori, RWTH Aachen Univ. (Germany)
Sascha Brose, RWTH Aachen Univ. (Germany)
Jochen Stollenwerk, RWTH Aachen Univ. (Germany)
Fraunhofer ILT- Institute for Laser Technology (Germany)
Peter Loosen, RWTH Aachen Univ. (Germany)
Fraunhofer ILT- Institute for Laser Technology (Germany)


Published in SPIE Proceedings Vol. 10959:
Metrology, Inspection, and Process Control for Microlithography XXXIII
Vladimir A. Ukraintsev; Ofer Adan, Editor(s)

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