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Proceedings Paper

Reflectivity of micromachined {111}-oriented silicon mirrors for optical input/output couplers
Author(s): Daniel J. Sadler; Maichael J. Garter; Chong Hyuk Ahn; Seungug Koh; Anthony L. Cook
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Paper Abstract

In this work, bulk-micromachined {111}-oriented silicon mirrors at 54.7 degree(s) have been fabricated in 20 wt% KOH solution at various temperatures and characterized with single mode fibers (10/125 and 5/125). In fabricating the mirrors, the etch rate of the (100) silicon surface was widely changed from 5.3 micrometers /hr to 73 micrometers /hr as the processing temperatures were varied from 40 degree(s)C to 80 degree(s)C. In spite of the tremendous variation of etch rate, the measured reflectivities of the mirrors showed fairly stable values of 63.7 - 58% at 1330 nm and 55.4 - 57.7% at 1550 nm respectively. This paper describes the silicon mirror processing conditions, measured reflectivities, reflected beam profiles, and a prototype integrated optical I/O coupler with the realized mirrors. The results obtained from this work show that optical I/O couplers with 54.7 degree(s) mirrors on conventional (100)-oriented silicon wafers are feasible, envisaging a synchronized optical clock distribution system as well as a distributed remote optical sensing system with low manufacturing cost.

Paper Details

Date Published: 23 September 1996
PDF: 10 pages
Proc. SPIE 2881, Microelectronic Structures and MEMS for Optical Processing II, (23 September 1996); doi: 10.1117/12.251255
Show Author Affiliations
Daniel J. Sadler, Univ. of Cincinnati (United States)
Maichael J. Garter, Univ. of Cincinnati (United States)
Chong Hyuk Ahn, Univ. of Cincinnati (United States)
Seungug Koh, Univ. of Dayton (United States)
Anthony L. Cook, NASA Langley Research Ctr. (United States)


Published in SPIE Proceedings Vol. 2881:
Microelectronic Structures and MEMS for Optical Processing II
M. Edward Motamedi; Wayne Bailey, Editor(s)

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