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Proceedings Paper

Release-etch modeling for complex surface-micromachined structures
Author(s): William P. Eaton; James H. Smith; Robert L. Jarecki
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Paper Abstract

A release etch model for etching sacrificial oxides in aqueous HF solutions is presented. This model is an extension of work done by Monk et. al. and Liu et. al The model is inherently one dimensional, but can be used to model the etching of complex three dimensional parts. Solutions and boundary conditions are presented for a number of geometries.

Paper Details

Date Published: 23 September 1996
PDF: 14 pages
Proc. SPIE 2879, Micromachining and Microfabrication Process Technology II, (23 September 1996); doi: 10.1117/12.251224
Show Author Affiliations
William P. Eaton, Sandia National Labs. (United States)
James H. Smith, Sandia National Labs. (United States)
Robert L. Jarecki, Sandia National Labs. (United States)


Published in SPIE Proceedings Vol. 2879:
Micromachining and Microfabrication Process Technology II
Stella W. Pang; Shih-Chia Chang, Editor(s)

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