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Advanced oxide thin films produced by excimer laser-assisted metal organic compound (ELAMOD) (Conference Presentation)
Author(s): Tetsuo Tsuchiya

Paper Abstract

To construct low carbon society more and more in the world, it is necessary to develop a high performances new green device such as a solar cell, a lithium battery, a power semiconductor, and light emitting diode (LED) lighting, superconducting device and so on. Metal oxides are expected to be key materials which are used for a new device by controlling metal composition, a crystal structure, orientation or multilayer of the film, a carrier, a spin, etc. In order to fabricate the new devices, their parameters controllable process would be effective. Another important problem is the development of the low cost and power saving process for constructing sustainable society in the world. For these purpose, chemical solution process (CSP) would be suitable because it does not require vacuum and high facility investments and any complicated etching process. In addition, precise metal composition control is possible when the materials are made from the more than 3 or 4 metal components. For the thin film processing, we have developed the photo-induced chemical solution process such as excimer laser-assisted metal organic deposition (ELAMOD) and photo reaction of nano-particle method (PRNP) for the preparation of the patterned metal oxide thin film on organic, glass and single crystalline substrates. By using the PRNP process, ITO, resistor and phosphor thin films were prepared on glass, PET and PIM substrates at room temperature. The luminescent thin film show higher luminescence compared with commercially available one. On the other hand, to prepare the epitaxial film, the use of the metal organic compound and single crystal substrate with large optical absorbance was found to be effective. By using the ELAMOD, epitaxial ITO, SnO2, LSMO, PZT films were successfully obtained at low temperature . Also, we have successfully prepared VO2 films with non-hysterisis. The TCR of the VO2 films obtained by ELAMOD exhibit much higher than present uncooled IR sensor. In this presentation, we demonstrate a preparations of ITO, resistor and phosphor thin films on flexible substrates.

Paper Details

Date Published: 13 March 2019
Proc. SPIE 10905, Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXIV, 109050Q (13 March 2019); doi: 10.1117/12.2511896
Show Author Affiliations
Tetsuo Tsuchiya, National Institute of Advanced Industrial Science and Technology (Japan)

Published in SPIE Proceedings Vol. 10905:
Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXIV
Tetsuya Makimura; Gediminas Račiukaitis; Carlos Molpeceres, Editor(s)

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