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Enhancing the wettability of PEDOT:PSS layer with plasma treatment method in perovskite solar cells
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Paper Abstract

Organic-inorganic hybrid perovskite solar cells have been widely recognized as an excellent candidate for next-generation photovoltaic devices because of their easy processing and rapidly developing power conversion efficiency (PCE). Owing to the fact that the interface is sensitive to photoelectric conversion properties, many strategies are used to improve the interface wettability between perovskite precursor solution and the hole transport layer (HTL). In this study, we report a method of argon plasma treatment on the poly(3,4-ethylene dioxythiophene):poly(styrene sulfonate) (PEDOT:PSS) layer which could effectively enhance the wettability because of the improvement in the chemical compositions and film morphologies of PEDOT:PSS. In contrast to untreated films, the wettability of PEDOT:PSS is increased by 3.3, 3.6 and 3.7 times based on the optimization of plasma power, treating time, and pressure, respectively. We also systematically described the timeliness of wettability from 0 to 8 hours after plasma treatment. The interface wettability shows a down trend with increasing storage time.

Paper Details

Date Published: 6 February 2019
PDF: 16 pages
Proc. SPIE 10842, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Subdiffraction-limited Plasmonic Lithography and Innovative Manufacturing Technology, 1084210 (6 February 2019); doi: 10.1117/12.2511402
Show Author Affiliations
Miao Yu, Univ. of Electronic Science and Technology of China (China)
Mingzhu Wang, Univ. of Electronic Science and Technology of China (China)
Yang Zhang, Univ. of Electronic Science and Technology of China (China)
Junze Shao, Univ. of Electronic Science and Technology of China (China)
Xiaona Huang, Chengdu Univ. of Technology (China)
Ruoyu Zhang, Univ. of Electronic Science and Technology of China (China)
Kuo Cao, Univ. of Electronic Science and Technology of China (China)
He Yu, Univ. of Electronic Science and Technology of China (China)
Wanli Zhang, Univ. of Electronic Science and Technology of China (China)


Published in SPIE Proceedings Vol. 10842:
9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Subdiffraction-limited Plasmonic Lithography and Innovative Manufacturing Technology
Mingbo Pu; Xiong Li; Xiaoliang Ma; Rui Zhou; Xuanming Duan; Xiangang Luo, Editor(s)

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