Share Email Print
cover

Proceedings Paper • new

Double-beam laser interference lithography based on optical field modulation
Format Member Price Non-Member Price
PDF $17.00 $21.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

In the micro-nano structure manufacturing field, large field of view, flexibility, and single exposure are the advantages of laser interference lithography. However, this method can only produce periodic patterns. In this paper, laser interference lithography and optical field modulation techniques are combined. By adjusting the parameters such as the phase and amplitude of the incident light beam, a light field modulation interference model was constructed to study the relationship between the parameters of the incident light beam and the intensity distribution of the interference light field. We verified the feasibility of the method through simulation. Considering the performance of existing optical modulation devices such as the pixel size of spatial light modulators, we discuss the challenges of this approach and the actual resolution that can be achieved. There is no doubt that this provides a new direction for the preparation of multiscale, variable period micro-nano patterns.

Paper Details

Date Published: 6 February 2019
PDF: 5 pages
Proc. SPIE 10842, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Subdiffraction-limited Plasmonic Lithography and Innovative Manufacturing Technology, 108421C (6 February 2019); doi: 10.1117/12.2510947
Show Author Affiliations
Fuping Peng, Univ. of Chinese Academy of Sciences (China)
Institute of Optics and Electronics (China)
Wei Yan, Institute of Optics and Electronics (China)
Fan Yang, Univ. of Chinese Academy of Sciences (China)
Institute of Optics and Electronics (China)
Fanxing Li, Univ. of Chinese Academy of Sciences (China)
Institute of Optics and Electronics (China)


Published in SPIE Proceedings Vol. 10842:
9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Subdiffraction-limited Plasmonic Lithography and Innovative Manufacturing Technology
Mingbo Pu; Xiong Li; Xiaoliang Ma; Rui Zhou; Xuanming Duan; Xiangang Luo, Editor(s)

© SPIE. Terms of Use
Back to Top