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Characterization of latent three-dimensional exposure patterns in photoresists
Author(s): Edy Yulianto; Vytautas Purlys; Vygantas Mizeikis
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Paper Abstract

We report on the imaging of latent 3D features exposed in photoresist during Direct Laser Write micro-/nanofabrication. The imaging method is based on monitoring of photoluminescence emitted by photonitiator in the photoresist, and exploits photoluminescence quenching and its dependence on the dose of the previous optical exposure. By spatially scanning focus of a low-intensity laser beam over the previously recorded latent features, spatial PL intensity maps reveal negative image of the latent pattern, and allows determination of feature size and shape prior to development. The imaging can be carried in situ, immediately after the fabrication, and does not require extensive modification to the existing equipment.

Paper Details

Date Published: 4 March 2019
PDF: 7 pages
Proc. SPIE 10930, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XII, 109300G (4 March 2019); doi: 10.1117/12.2510806
Show Author Affiliations
Edy Yulianto, Shizuoka Univ. (Japan)
Vytautas Purlys, Vilnius Univ. (Lithuania)
Vygantas Mizeikis, Shizuoka Univ. (Japan)


Published in SPIE Proceedings Vol. 10930:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XII
Georg von Freymann; Winston V. Schoenfeld; Raymond C. Rumpf, Editor(s)

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