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Optimized design, growth, and operation of frequency-stabilised GaN laser diodes and GaN tapered amplifiers at 461 nm (Conference Presentation)
Author(s): John Macarthur; Ludwig Prade; Christopher Carson; Caspar C. Clark; John Sharp; Yeshpal Singh; Kai Bongs; Steve Najda; P. Perlin; T. Suski; L. Marona; S. Stanczyk; P. Wisniewski; S. Grzanka; D. Schiavon; M. Leszczynski; Loyd McKnight
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Paper Abstract

consumption and financial burden of the multiple light sources required for such systems. The AlGaInN material system allows for single transverse mode laser diodes to be fabricated with optical powers up to 100 mW over a wide range from ~380 nm up to ~530 nm. By tuning the indium content and thickness of the GaInN quantum well, we have developed a range of AlGaInN diode-lasers targeted to meet the wavelength and power requirements suitable for optical clocks and atom interferometry systems. One of the major limiting factors in nitride laser diode development has been the lack of a suitable low defectivity and uniform GaN substrate. Recently, single crystal growth of large area, very low dislocation-density and uniform GaN substrates are grown using a combination of high temperature and high pressure enabling a range of AlGaInN laser technology to be developed. This direct light generation at the required wavelength is crucial to reduce complexity and size of the overall system, and to ensure a high wall-plug efficiency that is critical for space and mobile applications. We will present our development of GaN based, low SWaP, frequency-stabilised external-cavity seed and tapered amplifiers to operate at 461nm for first stage strontium cooling. This includes growth of custom optimised GaN epitaxy for operation at 461 nm, a robust ECDL geometry, a novel tapered amplifier design and important work in characterising the optical performance and minimising surface reflectivity to identify suitable working parameters.

Paper Details

Date Published: 13 March 2019
Proc. SPIE 10918, Gallium Nitride Materials and Devices XIV, 109180R (13 March 2019); doi: 10.1117/12.2509713
Show Author Affiliations
John Macarthur, Fraunhofer UK Research Ltd. (United Kingdom)
Ludwig Prade, Fraunhofer UK (United Kingdom)
Christopher Carson, Fraunhofer Ctr. for Applied Photonics (United Kingdom)
Caspar C. Clark, Helia Photonics Ltd. (United Kingdom)
John Sharp, Helia Photonics Ltd. (United Kingdom)
Yeshpal Singh, The Univ. of Birmingham (United Kingdom)
Kai Bongs, The Univ. of Birmingham (United Kingdom)
Steve Najda, TopGaN Ltd. (Poland)
P. Perlin, TopGaN Ltd. (Poland)
T. Suski, TopGaN Ltd. (Poland)
L. Marona, TopGaN Ltd. (Poland)
S. Stanczyk, TopGaN Ltd. (Poland)
P. Wisniewski, TopGaN Ltd. (Poland)
S. Grzanka, TopGaN Ltd. (Poland)
D. Schiavon, TopGaN Ltd. (Poland)
M. Leszczynski, TopGaN Ltd. (Poland)
Loyd McKnight, Fraunhofer UK Research Ltd. (United Kingdom)

Published in SPIE Proceedings Vol. 10918:
Gallium Nitride Materials and Devices XIV
Hiroshi Fujioka; Hadis Morkoç; Ulrich T. Schwarz, Editor(s)

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