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Proceedings Paper

Lateral force microscopy using cantilevers with integrated Wheatstone bridge piezoresistive deflection sensor
Author(s): Teodor Gotszalk; Ivo W. Rangelow; Piotr Dumania; Piotr B. Grabiec
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Paper Abstract

Atomic Force Microscope (AFM) is a very versatile instrument enabling precise surface investigations. The sensitivity of the AFM depends on the parameters of the detector system, which is used to observe the beam motions. In our experiments we have used a cantilever with integrated Wheatstone piezoresistive bridge as a deflection sensor. In this case of nonhomogeneous surfaces not only topography measurements but also investigations of other surface properties in nanometer scale are very important. In this paper we will describe the Lateral Force Microscope utilizing the Wheatstone bridge piezoresistive cantilever. During topography measurements of the nonhomogeneous smooth samples in contact mode the lateral/friction forces change depending on the on the substrate material differences. Thus friction forces imaging enables an investigation of the surface material structure. Measurement setup of the lateral force microscope with Wheatstone bridge piezoresistive cantilever will be presented. Noise considerations of the described lateral forces measurements method with Wheatstone bridge cantilever will be discussed. Measures for improving of the friction force observations will be proposed. We will show results of the topography and friction force measurements on chromium/quartz mask structure.

Paper Details

Date Published: 13 September 1996
PDF: 8 pages
Proc. SPIE 2880, Microlithography and Metrology in Micromachining II, (13 September 1996); doi: 10.1117/12.250958
Show Author Affiliations
Teodor Gotszalk, Technical Univ. of Wroclaw (Poland)
Ivo W. Rangelow, Univ. Kassel (Germany)
Piotr Dumania, Institute of Electron Technology (Poland)
Piotr B. Grabiec, Institute of Electron Technology (Poland)

Published in SPIE Proceedings Vol. 2880:
Microlithography and Metrology in Micromachining II
Michael T. Postek; Craig R. Friedrich, Editor(s)

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