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Proceedings Paper

Multilevel 3D patterning of stacked PMMA sheets for x-ray microlithography
Author(s): Gina M. Calderon; Kevin J. Morris; Olga Vladimirsky; Yuli Vladimirsky
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Paper Abstract

This paper presents a novel technique for fabricating 3D patterns in a thick layered resist and describes an alignment aide designed for the specific application of thick resist x-ray micromachining. In this technique, a PMMA layer of desired thickness is formed on a substrate by spinning or solvent bonding. The layer is exposed with X- rays to generate a latent image. A second layer of PMMA is bonded over the first layer and is exposed with an appropriate mask, generating a latent image in the second layer. This process can be repeated several times creating a 3D latent image. Simultaneous development forms a true 3D pattern in the PMMA resist.

Paper Details

Date Published: 13 September 1996
PDF: 5 pages
Proc. SPIE 2880, Microlithography and Metrology in Micromachining II, (13 September 1996); doi: 10.1117/12.250955
Show Author Affiliations
Gina M. Calderon, Louisiana State Univ. (United States)
Kevin J. Morris, Louisiana State Univ. (United States)
Olga Vladimirsky, Louisiana State Univ. (United States)
Yuli Vladimirsky, Louisiana State Univ. (United States)

Published in SPIE Proceedings Vol. 2880:
Microlithography and Metrology in Micromachining II
Michael T. Postek; Craig R. Friedrich, Editor(s)

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