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Development of hybrid measuring system for the complex micro-arrayed surface
Author(s): Tong Guo; Zhenshan Sun; Jinping Chen; Xing Fu; Xiaotang Hu
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Paper Abstract

As the ultra-precision machining technology is developing in various directions and evolving into a higher level, the micro-nano measurement technology is also developing constantly. According to the different manufacturing processes and texture of measurement objects, the requirements of micro-nano measurement technology vary a lot. Optical Microscopy (OM), Scanning Probe Microscopy (SPM) or Scanning Electron Microscopy (SEM) cannot meet requirements of high efficiency, high resolution and three-dimensional morphology characteristics obtaining at the same time. Hence a hybrid measuring system including the Atomic Force Microscopy (AFM) and vertical scanning white-light interferometry is built. The measurement function of the dual feedback AFM system was verified by scanning a one-dimensional grid and the measurement function of white light vertical scanning interferometer was verified by measuring the step structure and comparing it with a three-dimensional optical profiler. And then the micro-arrayed structure is measured by white light vertical scanning interferometry. The vertices of the micro-arrayed unit structure is scanned by using AFM in the same coordinate system to verify the complex measurement function of the system on the complex micro-arrayed surface.

Paper Details

Date Published: 7 March 2019
PDF: 10 pages
Proc. SPIE 11053, Tenth International Symposium on Precision Engineering Measurements and Instrumentation, 110530X (7 March 2019); doi: 10.1117/12.2509357
Show Author Affiliations
Tong Guo, Tianjin Univ. (China)
Zhenshan Sun, Tianjin Univ. (China)
Jinping Chen, Tianjin Univ. (China)
Xing Fu, Tianjin Univ. (China)
Xiaotang Hu, Tianjin Univ. (China)

Published in SPIE Proceedings Vol. 11053:
Tenth International Symposium on Precision Engineering Measurements and Instrumentation
Jiubin Tan; Jie Lin, Editor(s)

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