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Watt-class high-power and high-beam-quality VCSEL amplifiers
Author(s): Junichiro Hayakawa; Akemi Murakami; Daiki Tominaga; Yoshiyuki Suzuki; Zeuku Ho; Xiaodong Gu; Fumio Koyama
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Paper Abstract

We demonstrate the characteristics of 2 mm to 1 cm long vertical-cavity surface-emitting laser (VCSEL) amplifiers that emitted continuous wave (CW).

VCSELs have various applications in different fields, including datacom, optical interconnects, printers, and sensors. However, VCSEL technology has not been applied in laser material processing that needs a light source with high power density. This is because single-mode (SM) VCSELs have fundamental difficulty in producing beams having an output power of more than several milliwatts. On the contrary, the application range of VCSEL amplifiers is expected to be extended into fields that simultaneously require lasers with high power and high beam quality because they have the potential to attain both characteristics.

In this paper, we demonstrate the CW operation of high-power SM 2 mm to 1 cm long VCSEL amplifiers that had an output power of several watts at 20 °C. By optimizing the top-mirror reflectivity and seed-laser wavelength, the output power was linearly proportional to the amplifier length when the growth of amplified spontaneous emission (ASE) was suppressed. The I–L characteristics for different amplifier lengths were measured. All devices emitted narrow beams with divergence angles of approximately 0.1°. The maximum SM output power of the devices with lengths of 2 mm, 6 mm, and 1 cm were 0.62, 2.13, and 3.25 W, respectively. This result shows the possibility to achieve high power and high beam quality for direct semiconductor laser processing.

Paper Details

Date Published: 1 March 2019
PDF: 8 pages
Proc. SPIE 10938, Vertical-Cavity Surface-Emitting Lasers XXIII, 1093809 (1 March 2019); doi: 10.1117/12.2509153
Show Author Affiliations
Junichiro Hayakawa, Fuji Xerox Co., Ltd. (Japan)
Akemi Murakami, Fuji Xerox Co., Ltd. (Japan)
Daiki Tominaga, Fuji Xerox Co., Ltd. (Japan)
Yoshiyuki Suzuki, Fuji Xerox Co., Ltd. (Japan)
Zeuku Ho, Tokyo Institute of Technology (Japan)
Xiaodong Gu, Tokyo Institute of Technology (Japan)
Fumio Koyama, Tokyo Institute of Technology (Japan)

Published in SPIE Proceedings Vol. 10938:
Vertical-Cavity Surface-Emitting Lasers XXIII
Kent D. Choquette; Luke A. Graham, Editor(s)

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