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Demonstration of alignment-error-free pattering of tapered waveguide using fixed beam moving stage e-beam lithography
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Paper Abstract

We present a method to write a tapered waveguide using fixed-beam-moving-stage (FBMS) in an electron-beam lithography system. FBMS allows writing of large patterns without stitch-error, however, restricts only a few primitive shapes. For patterning tapers, a combination of FMBS with area-mode is used that typically results in alignment errors. The proposed method offers smooth and alignment-error-free tapering of sub-micron featured Silicon waveguide. We experimentally demonstrate a fully FBMS patterned photonic circuit with power splitter, wire-to-slot coupler, slot waveguide and a slotted ring resonator. The device response with insertion loss -1.35dB is measured using a tunable laser source around 1550 nm wavelength.

Paper Details

Date Published: 4 March 2019
PDF: 6 pages
Proc. SPIE 10930, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XII, 109301B (4 March 2019); doi: 10.1117/12.2509150
Show Author Affiliations
Viphretuo Mere, Ctr. for Nano Science and Engineering (CeNSE) (India)
Shankar Kumar Selvaraja, Ctr. for Nano Science and Engineering (CeNSE) (India)


Published in SPIE Proceedings Vol. 10930:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XII
Georg von Freymann; Winston V. Schoenfeld; Raymond C. Rumpf, Editor(s)

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