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Proceedings Paper

Productivity improvement through cycle time analysis
Author(s): Javier Bonal; Luis Rios; Carlos Ortega; Santiago Aparicio; Manuel Fernandez; Maria Rosendo; Alejandro Sanchez; Sergio Malvar
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Paper Abstract

A cycle time (CT) reduction methodology has been developed in the Lucent Technology facility (former AT&T) in Madrid, Spain. It is based on a comparison of the contribution of each process step in each technology with a target generated by a cycle time model. These targeted cycle times are obtained using capacity data of the machines processing those steps, queuing theory and theory of constrains (TOC) principles (buffers to protect bottleneck and low cycle time/inventory everywhere else). Overall efficiency equipment (OEE) like analysis is done in the machine groups with major differences between their target cycle time and real values. Comparisons between the current value of the parameters that command their capacity (process times, availability, idles, reworks, etc.) and the engineering standards are done to detect the cause of exceeding their contribution to the cycle time. Several friendly and graphical tools have been developed to track and analyze those capacity parameters. Specially important have showed to be two tools: ASAP (analysis of scheduling, arrivals and performance) and performer which analyzes interrelation problems among machines procedures and direct labor. The performer is designed for a detailed and daily analysis of an isolate machine. The extensive use of this tool by the whole labor force has demonstrated impressive results in the elimination of multiple small inefficiencies with a direct positive implications on OEE. As for ASAP, it shows the lot in process/queue for different machines at the same time. ASAP is a powerful tool to analyze the product flow management and the assigned capacity for interdependent operations like the cleaning and the oxidation/diffusion. Additional tools have been developed to track, analyze and improve the process times and the availability.

Paper Details

Date Published: 13 September 1996
PDF: 6 pages
Proc. SPIE 2876, Process, Equipment, and Materials Control in Integrated Circuit Manufacturing II, (13 September 1996); doi: 10.1117/12.250914
Show Author Affiliations
Javier Bonal, Lucent Technologies Microelectronica de Espana (Spain)
Luis Rios, Lucent Technologies Microelectronica de Espana (Spain)
Carlos Ortega, Lucent Technologies Microelectronica de Espana (Spain)
Santiago Aparicio, Lucent Technologies Microelectronica de Espana (Spain)
Manuel Fernandez, Lucent Technologies Microelectronica de Espana (Spain)
Maria Rosendo, Lucent Technologies Microelectronica de Espana (Spain)
Alejandro Sanchez, Lucent Technologies Microelectronica de Espana (Spain)
Sergio Malvar, Lucent Technologies Microelectronica de Espana (Spain)


Published in SPIE Proceedings Vol. 2876:
Process, Equipment, and Materials Control in Integrated Circuit Manufacturing II
Armando Iturralde; Te-Hua Lin, Editor(s)

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