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Proceedings Paper

Data-driven method for calculating limits for particle control charts
Author(s): Diane Michelson
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Paper Abstract

In semiconductor manufacturing, a key measure of product quality is the number of particles added during a fab processing step. Usual statistical process control methods assume an underlying normal distribution for the data. Particle measurements typically display skewed, nonnormal distributions, hence traditional control limits are not valid. This paper examines using bootstrap estimates of the upper percentiles of a distribution to find control limits for particle charts.

Paper Details

Date Published: 13 September 1996
PDF: 7 pages
Proc. SPIE 2876, Process, Equipment, and Materials Control in Integrated Circuit Manufacturing II, (13 September 1996); doi: 10.1117/12.250911
Show Author Affiliations
Diane Michelson, Harris Semiconductor (United States)


Published in SPIE Proceedings Vol. 2876:
Process, Equipment, and Materials Control in Integrated Circuit Manufacturing II
Armando Iturralde; Te-Hua Lin, Editor(s)

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