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Design and realization of 3D printed AFM probes (Conference Presentation)
Author(s): Nourin Alsharif; Anna Burkatovsky; Charles Lissandrello; Keith M. Jones; Alice E. White; Keith A. Brown
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Paper Abstract

Atomic force microscope (AFM) probes are the product of exceptionally refined silicon micromachining, but these structures, and AFM imaging by extension, are restricted by the limitations of these fabrication techniques. Here, the nanoscale additive manufacturing technique direct laser writing (DLW) is explored as a method to print monolithic cantilevered probes for AFM. Not only are these 3D printed probes found to function effectively for AFM, but they also confer several advantages, most notably the ability to image in intermittent contact mode with a bandwidth approximately ten times larger than analogous silicon probes. In addition, the arbitrary structural control afforded by 3D printing was found to enable programming the modal structure of the probe. These capabilities could be useful in the context of resonantly amplifying non-linear tip-sample interactions. Additionally, we explore two new architectures of 3D printed AFM probes that allow these structures to impact the fields of multi-probe imaging and lithography. Collectively, these results show that 3D printed probes complement those produced using conventional silicon micromachining and open the door to new imaging techniques.

Paper Details

Date Published: 4 March 2019
Proc. SPIE 10930, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XII, 109300D (4 March 2019); doi: 10.1117/12.2509091
Show Author Affiliations
Nourin Alsharif, Boston Univ. (United States)
Anna Burkatovsky, Boston Univ. (United States)
Charles Lissandrello, Boston Univ. (United States)
Keith M. Jones, Oxford Instruments (United Kingdom)
Alice E. White, Boston Univ. (United States)
Keith A. Brown, Boston Univ. (United States)

Published in SPIE Proceedings Vol. 10930:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XII
Georg von Freymann; Winston V. Schoenfeld; Raymond C. Rumpf, Editor(s)

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