Share Email Print
cover

Proceedings Paper

SPC qualification strategy for CD metrology
Author(s): Elizabeth E. Chain; Martin G. Ridens; James P. Annand
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Effective statistical process control (SPC) necessitates the use of the proper control chart, used to monitor and control the important process characteristics. The control chart can be used to monitor stability for a process which is normally distributed. Scanning electron microscopy (SEM) critical dimension (CD) measurement, however, shows a systematic variation in repeated measurements of a sample in addition to the Gaussian variation, due to the nature of electron beam irradiation of materials. Because of this systematic variation the standard control charts do not work well for the control of this process. Addition of a slope-subtraction algorithm to the data collection system provides display of the slope-corrected data in addition to the raw data display, and permits the stability of the metrology tool to be demonstrated.

Paper Details

Date Published: 13 September 1996
PDF: 7 pages
Proc. SPIE 2876, Process, Equipment, and Materials Control in Integrated Circuit Manufacturing II, (13 September 1996); doi: 10.1117/12.250906
Show Author Affiliations
Elizabeth E. Chain, Motorola (United States)
Martin G. Ridens, Motorola (United States)
James P. Annand, Motorola (United States)


Published in SPIE Proceedings Vol. 2876:
Process, Equipment, and Materials Control in Integrated Circuit Manufacturing II
Armando Iturralde; Te-Hua Lin, Editor(s)

© SPIE. Terms of Use
Back to Top