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Research on the control technology of machining marks in double-side polishing of large aperture optical element
Author(s): Ying Huang; Fang Zhao; Manze He; Xiang He
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Paper Abstract

For the high demand of large aperture optical element, the regular trajectory errors in machining marks of double-side polishing need to be determinately controlled. The mechanism and control method of the regular trajectory errors in machining marks were deeply studied. The process was simulated and compared with the experiment. The method of active translation and pendulum motion and polishing plate correction were proposed, proved to be efficacious on eliminating the regular machining marks by the groove of the polishing pad and local surface figure errors of the polishing plate. The method of dynamic loading and motion combination was adopted, retaining the independence of the original fast convergence process on surface figure. For the optical element with 430mm×430mm×10mm, the surface figure was controlled below 1λ(PV, λ=632.8nm). Meanwhile, the regular machining marks repeatedly produced were eliminated, which provided the essential condition for the intermediate frequency index in the rear stage, small tool precision polishing, and the high efficiency and stable machining of the optical element in the index system was realized.

Paper Details

Date Published: 16 January 2019
PDF: 7 pages
Proc. SPIE 10838, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 108381O (16 January 2019); doi: 10.1117/12.2507812
Show Author Affiliations
Ying Huang, Chengdu Fine Optical Engineering Research Ctr. (China)
Fang Zhao, Chengdu Fine Optical Engineering Research Ctr. (China)
Manze He, Chengdu Fine Optical Engineering Research Ctr. (China)
Xiang He, Chengdu Fine Optical Engineering Research Ctr. (China)


Published in SPIE Proceedings Vol. 10838:
9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Xiong Li; William T. Plummer; Bin Fan; Mingbo Pu; Yongjian Wan; Xiangang Luo, Editor(s)

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