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Proceedings Paper

SP resonance angle and Q-factor of metals in ultraviolet band
Author(s): Lanxi Duan; Saisai Qin; Yaru Li; Tao Jin; Zimin Li; Menglei Chen; Wangxia Huang; Jianping Shi
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Paper Abstract

Surface plasmon (SP) properties of more than dozen of metal materials have been comparative analyzed in ultraviolet (UV) band (436nm, 365nm) which are the typical light source used in SP lithography. We excited the SP wave by Otto configuration. The electromagnetic field in the structure were calculated by the full-vector FDTD algorithm. The SP resonance angle and the quality factor of the resonance peak were extracted. The results showed that the calculated SP resonance angle is approximately the same as the angle expected by the SP theory , and the error is no more than 5%. This gave an evidence that the SP theory is still applicable in the UV band although the theoretical model of permittivity, such as Drude, Lorentz and Debye, is ineffective at this time. We choose some metals with smaller errors to research the quality factor of SP resonance peaks. The results showed that even if the excitation angle was similar, the Q-factor was different which mean that the propagation length of the same SP wave was different. It can provide references for material selection when designing SP devices in UV band.

Paper Details

Date Published: 24 January 2019
PDF: 6 pages
Proc. SPIE 10840, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Micro- and Nano-Optics, Catenary Optics, and Subwavelength Electromagnetics, 108400K (24 January 2019); doi: 10.1117/12.2507756
Show Author Affiliations
Lanxi Duan, Anhui Normal Univ. (China)
Saisai Qin, Anhui Normal Univ. (China)
Yaru Li, Anhui Normal Univ. (China)
Tao Jin, Anhui Normal Univ. (China)
Zimin Li, Anhui Normal Univ. (China)
Menglei Chen, Anhui Normal Univ. (China)
Wangxia Huang, Anhui Normal Univ. (China)
Jianping Shi, Anhui Normal Univ. (China)


Published in SPIE Proceedings Vol. 10840:
9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Micro- and Nano-Optics, Catenary Optics, and Subwavelength Electromagnetics
Mingbo Pu; Xiong Li; Bin Fan; Min Gu; Reinhart Poprawe; Xiangang Luo, Editor(s)

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