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Proceedings Paper

Industrial microsystems on top of CMOS design and process
Author(s): Jordi Carrabina; Joaquin Saiz; David Marin; Xavier Marin; Angel Merlos; Joan Bausells
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Paper Abstract

We propose a design and technology methodology and CAD tools for a microsystems fabrication based on the 1.0 micrometers CMOS from ATMEL-ES2. In order to profit from vendor cell libraries, design kits have to be enhanced to deal with the new conception environment. Main contributions are, sensor dependent technology file, device modeling and automatic generation for different ranges, and adaptation of semi- custom tools (simulation environment and P and R) for complete microsystems design. A library of dedicated sensor cells is being designed using Cadence DFWII and the foundry design kit. These sensors are fabricated with the standard CMOS process plus some post-processing steps. Three levels of post-processing are considered: 1) pH-ISFET sensors fabricated using standard CMOS, 2) gas flow and radiation sensors based on thermopiles using simple post-processing. The post-processing is compatible with the foundry CMOS process. Our technology has been developed up tot he point of maximum simplification that results in the use of only one additional mask for back-side etching. Passivation layer together with oxide windows are used for front-side etching with excellent results.

Paper Details

Date Published: 17 September 1996
PDF: 12 pages
Proc. SPIE 2882, Micromachined Devices and Components II, (17 September 1996); doi: 10.1117/12.250717
Show Author Affiliations
Jordi Carrabina, Univ. Autonoma de Barcelona (Spain)
Joaquin Saiz, Univ. Autonoma de Barcelona (Spain)
David Marin, Univ. Autonoma de Barcelona (Spain)
Xavier Marin, Univ. Autonoma de Barcelona (Spain)
Angel Merlos, Ctr. Nacional de Microeletronica (Spain)
Joan Bausells, Ctr. Nacional de Microeletronica (Spain)


Published in SPIE Proceedings Vol. 2882:
Micromachined Devices and Components II
Kevin H. Chau; Ray M. Roop, Editor(s)

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