Share Email Print
cover

Proceedings Paper • new

Based on industrial inspection of the UV double-telecentric lens design
Author(s): Feng Lin
Format Member Price Non-Member Price
PDF $17.00 $21.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

In order to meet the requirements of high precision and high resolution in industrial inspection, this article designed a set of UV double-telecentric lenses with wide spectrum, low distortion, low magnification, and high resolution according to market requirements. Its design requirements are: UV dual-telecentric lens with working wavelength of 240nm-320nm, working distance of 98.7mm, working F number of 8, telecentricity of less than 1°, magnification of 0.241, and total system length of less than 160mm. This design takes into account the combination of cost and image quality, and finally adopts a global surface transmissive and non-glued solution. The system adopts double Gaussian as the initial structure, uses Zemax optical software to design; analyzes the tolerances of the design results based on the process requirements, determines the source of the tolerance error, and optimizes the related structure, finally designing the full-field modulation transfer function. (MTF) UV double-telecentric lens with diffraction limit up to 0.08% distortion. Compared with other UV systems, this system has the advantages of high imaging quality, high resolution, low distortion, and good telecentricity.

Paper Details

Date Published: 18 January 2019
PDF: 11 pages
Proc. SPIE 10839, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test, Measurement Technology, and Equipment, 108391G (18 January 2019); doi: 10.1117/12.2506597
Show Author Affiliations
Feng Lin, Fujian Normal Univ. (China)


Published in SPIE Proceedings Vol. 10839:
9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test, Measurement Technology, and Equipment
Fan Wu; Yudong Zhang; Xiaoliang Ma; Xiong Li; Bin Fan, Editor(s)

© SPIE. Terms of Use
Back to Top