Share Email Print
cover

Proceedings Paper • new

Structural modeling and strength characteristics of optical system in strong impact environment
Author(s): Xiaobin Hua; Jiancheng Lai; Chunyong Wang; Zhenhua Li; Yunjing Ji; Wei Yan
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

The starting and the stopping of the moving carrier can cause tens of thousands of gravitational accelerations of mechanical impact, which may lead to the damage of photoelectric detection parts, especially the optical system. For the study of the anti-overload ability of the optical system in strong impact environment, based on the finite element modeling method, taking the optical system with a diameter of 35 mm lens as the subject, the deformations and the stress nephograms of different materials of optical lenses under 10000g impact condition are obtained and the influences of different lens mounting structures on anti-overload ability of the system is analyzed. The consistency of the simulation results and the physical model test results, fully illustrates the correctness of the theory and the model. This paper explores an effective way for the analysis of the mechanical and structural evolution characteristics of optical system in strong impact environment.

Paper Details

Date Published: 6 February 2019
PDF: 7 pages
Proc. SPIE 10842, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Subdiffraction-limited Plasmonic Lithography and Innovative Manufacturing Technology, 108420I (6 February 2019); doi: 10.1117/12.2506549
Show Author Affiliations
Xiaobin Hua, Nanjing Univ. of Science and Technology (China)
Jiancheng Lai, Nanjing Univ. of Science and Technology (China)
Chunyong Wang, Nanjing Univ. of Science and Technology (China)
Zhenhua Li, Nanjing Univ. of Science and Technology (China)
Yunjing Ji, Nanjing Univ. of Science and Technology (China)
Wei Yan, Nanjing Univ. of Science and Technology (China)


Published in SPIE Proceedings Vol. 10842:
9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Subdiffraction-limited Plasmonic Lithography and Innovative Manufacturing Technology
Mingbo Pu; Xiong Li; Xiaoliang Ma; Rui Zhou; Xuanming Duan; Xiangang Luo, Editor(s)

© SPIE. Terms of Use
Back to Top