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Annealing effects on the structural and optical properties of HfO2 thin films deposited by thermal evaporation technique
Author(s): Shida Li; Xiaoli Liu ; Huasong Liu ; Lishuan Wang; Yugang Jiang ; Peng Shang; Xiao Yang ; Dandan Liu ; Yiqin Ji
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Paper Abstract

Hafnium oxide (HfO2) thin films has been prepared on glass substrates at room temperature by thermal evaporation technique using HfO2 powders (99% purity) and then are annealed at different temperatures ranging from 150° to 450° for 24 hours in air. The effects of the annealing temperatures on the structural and optical properties of the HfO2 thin films were studied. Amorphous structures of the HfO2 films were researched by XRD technology. The results of the study show that the state of the HfO2 film changes from amorphous to polycrystalline with the increase of heat treatment temperature and the the stress is released. Besides, the refractive index of the films decreases and the band energy changes significantly. Therefore, the heat treatment can effectively change the film properties and it is necessary to comprehensively select the optimal heat treatment temperature according to the specific application of the HfO2 thin films.

Paper Details

Date Published: 16 January 2019
PDF: 5 pages
Proc. SPIE 10838, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 108381L (16 January 2019); doi: 10.1117/12.2506510
Show Author Affiliations
Shida Li, Tianjin Jinhang Institute of Technical Physics (China)
Xiaoli Liu , Air Force Agent Office (China)
Huasong Liu , Tianjin Jinhang Institute of Technical Physics (China)
Lishuan Wang, Tianjin Jinhang Institute of Technical Physics (China)
Yugang Jiang , Tianjin Jinhang Institute of Technical Physics (China)
Peng Shang, Tianjin Jinhang Institute of Technical Physics (China)
Xiao Yang , Tianjin Jinhang Institute of Technical Physics (China)
Dandan Liu , Tianjin Jinhang Institute of Technical Physics (China)
Yiqin Ji , Tianjin Jinhang Institute of Technical Physics (China)


Published in SPIE Proceedings Vol. 10838:
9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Xiong Li; William T. Plummer; Bin Fan; Mingbo Pu; Yongjian Wan; Xiangang Luo, Editor(s)

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