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Thin film thickness measurement based on laser heterodyne interferometry
Author(s): Kai Shi; Junhong Su
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Paper Abstract

For the difficulty of measuring thin film thickness, a method of thin film thickness measurement based on laser heterodyne interferometry is proposed. Thin film difference of this method is generated by the relative optical path difference of Michelson interference light path with principle of heterodyne interference. The thickness is got by precision displacement table in line-by-line scaning. The shift of measurement system is about 8nm with constant temperature. Average deviation of measuring results is about 5nm. The comparison with ellipsometer shows the correctness of the method.

Paper Details

Date Published: 18 January 2019
PDF: 7 pages
Proc. SPIE 10839, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test, Measurement Technology, and Equipment, 1083919 (18 January 2019); doi: 10.1117/12.2506460
Show Author Affiliations
Kai Shi, Xi'an Technological Univ. (China)
Junhong Su, Xi'an Technological Univ. (China)


Published in SPIE Proceedings Vol. 10839:
9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test, Measurement Technology, and Equipment
Fan Wu; Yudong Zhang; Xiaoliang Ma; Xiong Li; Bin Fan, Editor(s)

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