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Organic-inorganic hybrid perovskite photodetectors achieved via brush-coating process
Author(s): Siheng Xiang; Huaiyuan Dong; Jiang Huang
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Paper Abstract

A new class of semiconducting materials called organic-inorganic halide perovskites hereafter could lead to commercial photoelectric devices due to the ultrahigh-performance and low cost. Meanwhile, perovskite-based photodetectors also have a rapid evolution in recent years. On the part of optical sensors, visible light detection is crucial for many applications, including imaging, medical treatment, industrial auto-control and so on. However, it is difficult for traditional preparation techniques to reach large-scale preparation accompanied by splendid performance of the device. Herein, we reported a method for high performance photodetctor by brush-coating. The device structure of the photodetector is ITO/PEDOT:PSS/CH3NH3PbI2.4Br0.6/PC61BM/C60/LiF/Ag, and the composite perovskites are consisting of CH3NH3PbI3 and CH3NH3PbBr3 with optimized mixing ratio which is crucial for not only enhancing the photon absorption but also ensuring a adjustable detection range .The device shows an excellent detectivity of ~1011 Jones under the illumination of 650 nm light at the bias of -0.5V. Due to the brush-coating process, the dark current is effectively suppressed down to 10-10 A. The present results suggest a promising strategy for fabricating outstanding perovskite-based photodetectors and provide a potential strategy for large-area fabrication.

Paper Details

Date Published: 6 February 2019
PDF: 6 pages
Proc. SPIE 10842, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Subdiffraction-limited Plasmonic Lithography and Innovative Manufacturing Technology, 108420T (6 February 2019); doi: 10.1117/12.2506449
Show Author Affiliations
Siheng Xiang, Univ. of Electronic Science and Technology of China (China)
Huaiyuan Dong, Univ. of Electronic Science and Technology of China (China)
Jiang Huang, Univ. of Electronic Science and Technology of China (China)


Published in SPIE Proceedings Vol. 10842:
9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Subdiffraction-limited Plasmonic Lithography and Innovative Manufacturing Technology
Mingbo Pu; Xiong Li; Xiaoliang Ma; Rui Zhou; Xuanming Duan; Xiangang Luo, Editor(s)

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