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Proceedings Paper • new

Additive manufacturing of millimeter-scale micron-accuracy 3D structures
Author(s): Hua Yang; Yuan-Yuan Zhao; Feng Jin; Jie Liu; Xian-Zi Dong; Mei-Ling Zheng; Xuan-Ming Duan; Zhen-Sheng Zhao
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Paper Abstract

In this work, we demonstrate a developed 3D printing based on two-photon polymerization for achieving millimeter-scale, micron-accuracy 3D structures (MM-3DS), which combines the femtosecond laser of 800 nm and low magnification objective lens of 10×. The commercial photoresist SU-8 is used in 3D printing system for improving mechanical strength and chemical stability of MM-3DS. The 3D microstructures are preprogrammed and optimized by considering the scanning mode and experiment parameters. During 3D printing process, micron features are written within the interior of SU-8 film via localized polymerization driven by nonlinear two-photon absorption process. By the 3D movement in ~1 mm scale of the focused beam, a customized MM-3DS can be produced. We have fabricated a customized MM-3DS with a size of 1.6 mm and an accuracy of 10 μm. The influence of volume for the printing structures Vs on the printing time T exhibits a linear behavior, indicating that the printing speed is 0.248 mm3/h under the current conditions. This technology offers a flexible and low-cost method of generating highly customizable, precisely controlled MM-3DS, which is promising for the manufacture of complex functional structures and devices for the microfluidics, microelectronics, photonics and so on.

Paper Details

Date Published: 6 February 2019
PDF: 7 pages
Proc. SPIE 10842, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Subdiffraction-limited Plasmonic Lithography and Innovative Manufacturing Technology, 108420B (6 February 2019); doi: 10.1117/12.2506103
Show Author Affiliations
Hua Yang, Technical Institute of Physics and Chemistry (China)
Univ. of Chinese Academy of Sciences (China)
Yuan-Yuan Zhao, Chongqing Institute of Green and Intelligent Technology (China)
Feng Jin, Technical Institute of Physics and Chemistry (China)
Jie Liu, Technical Institute of Physics and Chemistry (China)
Xian-Zi Dong, Technical Institute of Physics and Chemistry (China)
Mei-Ling Zheng, Technical Institute of Physics and Chemistry (China)
Xuan-Ming Duan, Chongqing Institute of Green and Intelligent Technology (China)
Zhen-Sheng Zhao, Technical Institute of Physics and Chemistry (China)


Published in SPIE Proceedings Vol. 10842:
9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Subdiffraction-limited Plasmonic Lithography and Innovative Manufacturing Technology
Mingbo Pu; Xiong Li; Xiaoliang Ma; Rui Zhou; Xuanming Duan; Xiangang Luo, Editor(s)

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