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Study of the linewidth measurement with scanning electron microscope based on laser interference principle
Author(s): Bohua Yin; Mingzhang Chu; Guanglu Xu; Xue Li; Junbiao Liu; Daixie Chen; Han Li; Chao Jiang; Xiaoyong Cai
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Paper Abstract

As an imaging tool of nanometer resolution for microstructure analysis, the scanning electron microscope plays an important role in semiconductor and nanometer structure measurement. In this study, a special scanning electron microscopy imaging and line width measuring method is introduced based on principle of laser interference. We design the double stages including micron resolution stage and nanometer resolution stage. A new imaging mode by raster scanning of precision stage is employed in this metrological scanning electron microscope. The line width of standard sample image is measured precisely by calculating the coordination data that come from the laser interferometer system. This nanostructure measuring method is in line with international standard for the dimension measurement of traceability.

Paper Details

Date Published: 24 January 2019
PDF: 6 pages
Proc. SPIE 10840, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Micro- and Nano-Optics, Catenary Optics, and Subwavelength Electromagnetics, 108400U (24 January 2019); doi: 10.1117/12.2505766
Show Author Affiliations
Bohua Yin, Institute of Electrical Engineering (China)
Mingzhang Chu, Institute of Electrical Engineering (China)
Guanglu Xu, Institute of Electrical Engineering (China)
Xue Li, Institute of Electrical Engineering (China)
Junbiao Liu, Institute of Electrical Engineering (China)
Daixie Chen, Institute of Electrical Engineering (China)
Han Li, Institute of Electrical Engineering (China)
Chao Jiang, National Ctr. for Nanoscience and Technology of China (China)
Xiaoyong Cai, National Ctr. for Nanoscience and Technology of China (China)


Published in SPIE Proceedings Vol. 10840:
9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Micro- and Nano-Optics, Catenary Optics, and Subwavelength Electromagnetics
Mingbo Pu; Xiong Li; Bin Fan; Min Gu; Reinhart Poprawe; Xiangang Luo, Editor(s)

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