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Design of bifocal compound eyes and gray mask fabrication based on maskless photolithography
Author(s): Jianghui Liu; Junbo Liu; Qingyuan Deng; Yan Tang; Song Hu
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Paper Abstract

Maskless photolithography was proposed to achieve the conventional and low-cost micro and nano fabrication, the pivotal of such technology was the application of digital micro-mirrors devices (DMD). Based on maskless photolithography, we designed a specific bifocal compound eyes (BCE) which made up of an array of two superimposed microlens. However, during our experiments, we found the existence of nonlinear relationships among gray levels, exposure intensity and development depths. To precise control the surface profiles, we did several tests and interpolations were used on the data we gathered. Finally, we ascertained the development depth of each grayscale, a gray mask was designed and filled to 1024*768 to fit the size of DMD.

Paper Details

Date Published: 6 February 2019
PDF: 6 pages
Proc. SPIE 10842, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Subdiffraction-limited Plasmonic Lithography and Innovative Manufacturing Technology, 108421B (6 February 2019); doi: 10.1117/12.2505369
Show Author Affiliations
Jianghui Liu, Institute of Optics and Electronics (China)
Junbo Liu, Institute of Optics and Electronics (China)
Qingyuan Deng, Institute of Optics and Electronics (China)
Yan Tang, Institute of Optics and Electronics (China)
Song Hu, Institute of Optics and Electronics (China)


Published in SPIE Proceedings Vol. 10842:
9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Subdiffraction-limited Plasmonic Lithography and Innovative Manufacturing Technology
Mingbo Pu; Xiong Li; Xiaoliang Ma; Rui Zhou; Xuanming Duan; Xiangang Luo, Editor(s)

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