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Correction for thickness uniformity of film deposited by ion beam sputtering on large optical components
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Paper Abstract

It is a critical technology to improve the optical film uniformity during the film deposition process. The ion beam sputtering and polishing system was used to prepare the film on the surface of large-aperture optical elements. A calculation method for controlling the dwell time ratio I of the ion beam working at the center and edge of optical component was proposed. The dwell time ratio I was calculated by the film thickness data obtained from the center and edge, and the dwell time ratio I was revised step by step. Then it was input in the program as one of the sputtering process parameters. The experimental results show that, when I was revised to -26.6%, uniform film can be achieved on optical elements with a diameter of 300mm-600mm. Taking a Si film on the surface of fused silica as an example, the experiment was carried out for 6 hours. The film thickness is about 212 nm, and the film uniformity could reach up to 0.42%, which meets film thickness uniformity requirements by ion beam sputtering deposition method.

Paper Details

Date Published: 16 January 2019
PDF: 9 pages
Proc. SPIE 10838, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 1083814 (16 January 2019); doi: 10.1117/12.2505365
Show Author Affiliations
Xiaojing Li, Inner Mongolia Metal Materials Institute (China)
Dasen Wang, Inner Mongolia Metal Materials Institute (China)
Shun Zhou, Xi'an Technological Univ. (China)
Shi Feng, Changchun Univ. of Science and Technology (China)
Xu Zhang, Changchun Univ. of Science and Technology (China)
Ning Pei, Inner Mongolia Metal Materials Institute (China)
Hailin Guo, Inner Mongolia Metal Materials Institute (China)
Fengming Nie, Inner Mongolia Metal Materials Institute (China)


Published in SPIE Proceedings Vol. 10838:
9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Xiong Li; William T. Plummer; Bin Fan; Mingbo Pu; Yongjian Wan; Xiangang Luo, Editor(s)

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