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Effects of magnetorheological processing parameters on the force of optical elements
Author(s): Jing Hou; Hong-xiang Wang; Xian-hua Chen; Jie Li; Bo Zhong; Wen-hui Deng
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Paper Abstract

Magnetorheological finishing (MRF) is a deterministic optical element polishing method that achieves material removal by means of the sheared and rheo-logical behavior of magnetorheological fluids. For the magnetorheological processing optics, an experimental study of the magnetorheological processing force was carried out. It was obtained that the relationship between the process parameters and element forces in magnetorheological polishing .The process parameters in MRF are the rotation speed of the polishing wheel, the magnetic field strength, the liquid flow rate, and the immersion depth. For MRF-600 magnetorheological polishing machine with polishing wheel Φ300mm, the normal forces range from 2N to 32N.According to the fitting curve between the magnetic field and the normal forces, the force is 6 times larger than that under the zero magnetic field condition. At the same time, the polished spots were collected under different magnetic field intensity. The law of the removal rate of polishing spots was obtained.

Paper Details

Date Published: 16 January 2019
PDF: 5 pages
Proc. SPIE 10838, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 1083813 (16 January 2019); doi: 10.1117/12.2505334
Show Author Affiliations
Jing Hou, Research Ctr. of Laser Fusion (China)
Harbin Institute of Technology (China)
Hong-xiang Wang, Harbin Institute of Technology (China)
Xian-hua Chen, Research Ctr. of Laser Fusion (China)
Jie Li, Research Ctr. of Laser Fusion (China)
Bo Zhong, Research Ctr. of Laser Fusion (China)
Wen-hui Deng, Research Ctr. of Laser Fusion (China)


Published in SPIE Proceedings Vol. 10838:
9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Xiong Li; William T. Plummer; Bin Fan; Mingbo Pu; Yongjian Wan; Xiangang Luo, Editor(s)

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