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The angular measurement of the motion direction of the stack motion platform based on the dual-frequency laser interferometer
Author(s): Guanghua Yang; Yuejing Qi; Yu Wang; Zengxiong Lu; Jiani Su; Wei Qi; Bing Li
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Paper Abstract

In an aberration measurement for the lithographic projection lens based on the lateral shear interferometry, stage needs move tens of nanometers to do phase motion, and move tens of millimeters to shift field points. But the stage met the both requirements is very expensive. Usually using a fine stage fold on a coarse stage to meet the both requirements. Whereas this method has a difficult to overcome since the both stages hardly keep the same motion direction. This article proposes a method to measure the angle between the stages motion direction based on the dual-frequency laser interferometer by respectively moving the both stages and flowing the 45 degrees. The measurement accuracy able reach the 0.10 mrad and meet the aberration measurement requirement.

Paper Details

Date Published: 18 January 2019
PDF: 6 pages
Proc. SPIE 10839, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test, Measurement Technology, and Equipment, 108390X (18 January 2019); doi: 10.1117/12.2505151
Show Author Affiliations
Guanghua Yang, Academy of Opto-Electronics (China)
Univ. of Chinese Academy of Sciences (China)
Yuejing Qi, Academy of Opto-Electronics (China)
Yu Wang, Institute of Microelectronics (China)
Zengxiong Lu, Academy of Opto-Electronics (China)
Jiani Su, Academy of Opto-Electronics (China)
Wei Qi, Academy of Opto-Electronics (China)
Bing Li, Academy of Opto-Electronics (China)


Published in SPIE Proceedings Vol. 10839:
9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test, Measurement Technology, and Equipment
Fan Wu; Yudong Zhang; Xiaoliang Ma; Xiong Li; Bin Fan, Editor(s)

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