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The effect of ion beam etching process on laser damage resistance of fused silica
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Paper Abstract

The effect of ion beam etching process on the surface quality, the surface roughness and the laser-induced damage threshold at 351nm was carried out. Research results reveal that the laser-induced damage threshold of fused silica was enhanced with the increase of etching depth when the etching depth was less than 800nm, and could be further enhanced about 30% at 800nm etching depth, however the laser-induced damage threshold began to decrease with the further increase of etching depth(more than 800nm). The test results of surface microtopography, laser damage morphology, and surface roughness reveal that the ion beam etching process can remove polishing re-deposition layer without degrading the surface condition at a smaller etching depth so as to enhance the laser-induced damage threshold of fused silica, however further ion etching which can produce impurity particle often results in a decrease rather than an increase of laser-induced damage threshold.

Paper Details

Date Published: 16 January 2019
PDF: 8 pages
Proc. SPIE 10838, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 1083810 (16 January 2019); doi: 10.1117/12.2505146
Show Author Affiliations
Gang Wang, Chengdu Fine Optical Engineering Research Ctr. (China)
Chao Cai, Chengdu Fine Optical Engineering Research Ctr. (China)
Xiang He, Chengdu Fine Optical Engineering Research Ctr. (China)
Jin Yong Huang, Chengdu Fine Optical Engineering Research Ctr. (China)
Ping Ma, Chengdu Fine Optical Engineering Research Ctr. (China)
Ding Yao Yan, Chengdu Fine Optical Engineering Research Ctr. (China)


Published in SPIE Proceedings Vol. 10838:
9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Xiong Li; William T. Plummer; Bin Fan; Mingbo Pu; Yongjian Wan; Xiangang Luo, Editor(s)

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