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A true-color nano-CT based on SEM
Author(s): Weixia Zhao; Junbiao Liu; Geng Niu; Yutian Ma; Yan Wang; Li Han
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Paper Abstract

Nano-CT provides a brand new tool for the research of biology, life sciences, archeology and artifacts, and new materials for its excellent nondestructive detecting capability, especially in the non-destructive testing of carbon and hydrogen polymer light element materials. However, typical conventional Nano-CT cannot perform high-resolution and contrast imaging on structure of materials with small differences in X-ray absorption, and the traditional color CT which can achieve this function has low ray intensity and poor image quality when observed on light-element materials. Therefore, a true-color Nano-CT based on FEI Quanta 600 SEM is proposed in this paper. Three different material targets, Cr, Cu, and W, are introduced to obtain different energy rays. High-sensitivity CCD detector and single-circle scanning method are used to acquire projection data and reconstruct three CT images with different energies. Finally, principal component analysis (PCA) algorithm is used to extract the three principal components as color and the three primary colors of the image are combined to form a true-color image. The true-color Nano-CT can perform high-resolution imaging of substances with similar attenuation coefficients but different compositions with high resolution.

Paper Details

Date Published: 6 February 2019
PDF: 6 pages
Proc. SPIE 10842, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Subdiffraction-limited Plasmonic Lithography and Innovative Manufacturing Technology, 108420P (6 February 2019); doi: 10.1117/12.2504965
Show Author Affiliations
Weixia Zhao, Institute of Electrical Engineering (China)
Junbiao Liu, Institute of Electrical Engineering (China)
Univ. of Chinese Academy of Sciences (China)
Geng Niu, Institute of Electrical Engineering (China)
Univ. of Chinese Academy of Sciences (China)
Yutian Ma, Institute of Electrical Engineering (China)
Yan Wang, Institute of Electrical Engineering (China)
Univ. of Chinese Academy of Sciences (China)
Li Han, Institute of Electrical Engineering (China)
Univ. of Chinese Academy of Sciences (China)


Published in SPIE Proceedings Vol. 10842:
9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Subdiffraction-limited Plasmonic Lithography and Innovative Manufacturing Technology
Mingbo Pu; Xiong Li; Xiaoliang Ma; Rui Zhou; Xuanming Duan; Xiangang Luo, Editor(s)

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