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Construction and research of APD detection based on double stochastic process
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Paper Abstract

The working processes of various APD (Avalanche photodiode)laser active detection equipment includes: laser emission, laser transmission in the atmosphere, and APD laser detection three parts. Among them, due to the influence of atmospheric turbulence on the laser, the intensity of laser on the APD detection surface randomly fluctuates over time, after the laser is transmitted through the turbulence atmosphere. The process of APD detecting the laser light reaching its receiving end face is accompanied by noise generation. Combined with the central limit theorem, the APD output current conforms to a Gaussian distribution. The CLAP software was used to simulate the propagation of the laser in the turbulent atmosphere, and the probability distribution of the intensity fluctuation over a limited area under various atmosphere fluctuation conditions was obtained. Using several distribution functions to fit the probability distribution of light intensity fluctuations, it was found that the Exponential Weibull distribution has a good fitting effect on simulation data. Based on the above research results, a detection model of the Exponential Weibull-Gaussian double stochastic process of APD is established. Using the obtained Exponential Weibull distribution parameters and the dual stochastic process model to simulate the APD detection process, the probability density curve of the ADP output current is obtained and compared with the fluctuation of the light intensity at the receiving end surface, thereby verifying the influence of the double stochastic process on the detection process.

Paper Details

Date Published: 8 February 2019
PDF: 8 pages
Proc. SPIE 10843, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optoelectronic Materials and Devices for Sensing and Imaging, 108430B (8 February 2019); doi: 10.1117/12.2504963
Show Author Affiliations
Hexiong Liu, Army Engineering Univ. (China)
BIng Zhou, Army Engineering Univ. (China)
Xuan He, Army Engineering Univ. (China)


Published in SPIE Proceedings Vol. 10843:
9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optoelectronic Materials and Devices for Sensing and Imaging
Yadong Jiang; Xiaoliang Ma; Xiong Li; Mingbo Pu; Xue Feng; Bernard Kippelen, Editor(s)

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