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Near field optical lithography using ultra-small gap bowtie apertures
Author(s): Liang Wang; Jin Qin
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Paper Abstract

Near filed optical lithography has been a promising alternative to photolithography for its high resolution, low cost and high throughput. Bowtie aperture, one type of nanoscale ridge aperture, is widely used in near filed optical lithography. However, the bowtie structure milled by focused ion beam (FIB) usually suffers from non-vertical sidewall with taper and rounded corner due to Gaussian ion beam profile and redeposition effects. Here, we report a novel method to fabricate bowtie aperture with sub-15 nm gap, producing highly confined electric near-field by localized surface plasmon (LSP) excitation and nanofocusing of the closely tapered gap. Utilizing a passive flexure stage for contact control, we present our recent lithography results with a record 20 nm resolution (FWHM).

Paper Details

Date Published: 6 February 2019
PDF: 7 pages
Proc. SPIE 10842, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Subdiffraction-limited Plasmonic Lithography and Innovative Manufacturing Technology, 108421A (6 February 2019); doi: 10.1117/12.2504905
Show Author Affiliations
Liang Wang, Univ. of Science and Technology of China (China)
Jin Qin, Univ. of Science and Technology of China (China)


Published in SPIE Proceedings Vol. 10842:
9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Subdiffraction-limited Plasmonic Lithography and Innovative Manufacturing Technology
Mingbo Pu; Xiong Li; Xiaoliang Ma; Rui Zhou; Xuanming Duan; Xiangang Luo, Editor(s)

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