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Generating mechanism and eliminating method of striated haze in advanced mitigation process
Author(s): Heng Zhao; Chao Cai; Xiang He; Jinyong Huang; Ping Ma
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Paper Abstract

Advanced mitigation process (AMP) has been identified as a most effective method to improve the laser induced damage threshold of the fused silica optics used in the large laser facility, and as the most important sub-process HF etching with multi-frequency megasonic agitation plays a decisive role to improve the damage threshold of fused silica. But because of the physical characteristics of megasonic, the etched surface is apt to generate striated haze which not only modulates the optical field, but also reduces the damage threshold significantly. In this paper, the generating mechanism of the striated haze is discussed, and both of the uneven acoustic field distribution and the optics' redeposited substance are recognized as the primary factor resulted this phenomenon, ultimately based on these discussions a slight swing when etching is proposed to eliminate this phenomenon.

Paper Details

Date Published: 16 January 2019
PDF: 7 pages
Proc. SPIE 10838, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 108380C (16 January 2019); doi: 10.1117/12.2504849
Show Author Affiliations
Heng Zhao, Chengdu Fine Optical Engineering Research Ctr. (China)
Chao Cai, Chengdu Fine Optical Engineering Research Ctr. (China)
Xiang He, Chengdu Fine Optical Engineering Research Ctr. (China)
Jinyong Huang, Chengdu Fine Optical Engineering Research Ctr. (China)
Ping Ma, Chengdu Fine Optical Engineering Research Ctr. (China)


Published in SPIE Proceedings Vol. 10838:
9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Xiong Li; William T. Plummer; Bin Fan; Mingbo Pu; Yongjian Wan; Xiangang Luo, Editor(s)

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