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Dynamic fractal digital lithography for the fabrication of microlens array
Author(s): Zhimin Zhang; Zhihuai Liu; Ningning Luo
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Paper Abstract

To improve the transverse resolution of digital mask lithography pattern, we present a novel dynamic fractal digital lithography to fabricate microlens array. The basic idea of this technique is to divide a high-frequency digital mask into a group of low-frequency masks by using equal-height-rounding quantization. Consequently, dynamic fractal digital lithography has the advantage in decrease of mask quantity and mask quantization error. Then these low-frequency masks are exposed in sequence and the superimposed exposure of multiple masks takes the place of single exposure of original high-frequency mask. We demonstrate the feasibility of dynamic fractal digital lithography by experimental fabrication. The uniform microlens array with smooth surface and clear edge profile are achieved.

Paper Details

Date Published: 24 January 2019
PDF: 8 pages
Proc. SPIE 10840, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Micro- and Nano-Optics, Catenary Optics, and Subwavelength Electromagnetics, 1084012 (24 January 2019); doi: 10.1117/12.2504760
Show Author Affiliations
Zhimin Zhang, Nanchang Hangkong Univ. (China)
Zhihuai Liu, Jiangxi Lianchuang Optoelectronic Technology Co., Ltd. (China)
Ningning Luo, Nanchang Hangkong Univ. (China)


Published in SPIE Proceedings Vol. 10840:
9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Micro- and Nano-Optics, Catenary Optics, and Subwavelength Electromagnetics
Mingbo Pu; Xiong Li; Bin Fan; Min Gu; Reinhart Poprawe; Xiangang Luo, Editor(s)

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