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Study on the design and preparation of wideband deep cutoff bandpass filter
Author(s): Yugang Jiang; Huasong Liu; Dan Chen; Lishuan Wang; Dandan Liu; Shida Li; Jiahuan He; Chenghui Jiang; Yiqin Ji
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Paper Abstract

Bandpass filters are indispensable to the development of advanced optical and electro-optical systems used in space, defense, and terrestrial applications. In this paper, wideband deep cutoff bandpass filter of 750-900nm was designed and prepared by ion beam sputtering deposition technology. Long wave pass filter with high transmittance from 750 to 900nm and low transmittance from 400 to 730nm was designed and prepared on one side of the HB720 substrate. Short wave pass filter with high transmittance from 750 to 900nm and low transmittance from 930 to 1100nm was designed and prepared on the other side of the HB720 substrate. From the measured transmittance curve, the average transmittance was above 96% from 750nm to 900nm, the transmittance at the wavelength of 728nm and 928nm was less than 0.1%. The results indicated that high quality bandpass filter can be manufactured using the combination method of long-wave and short-wave filters.

Paper Details

Date Published: 12 December 2018
PDF: 8 pages
Proc. SPIE 10847, Optical Precision Manufacturing, Testing, and Applications, 1084708 (12 December 2018); doi: 10.1117/12.2504060
Show Author Affiliations
Yugang Jiang, Tianjin Jinhang Institute of Technical Physics (China)
Huasong Liu, Tianjin Jinhang Institute of Technical Physics (China)
Dan Chen, Tianjin Jinhang Institute of Technical Physics (China)
Lishuan Wang, Tianjin Jinhang Institute of Technical Physics (China)
Harbin Institute of Technology (China)
Dandan Liu, Tianjin Jinhang Institute of Technical Physics (China)
Shida Li, Tianjin Jinhang Institute of Technical Physics (China)
Jiahuan He, Tianjin Jinhang Institute of Technical Physics (China)
Chenghui Jiang, Tianjin Jinhang Institute of Technical Physics (China)
Yiqin Ji, Tianjin Jinhang Institute of Technical Physics (China)
Harbin Institute of Technology (China)


Published in SPIE Proceedings Vol. 10847:
Optical Precision Manufacturing, Testing, and Applications
John McBride; JiuBin Tan; Sen Han; Xuejun Zhang, Editor(s)

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