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NXE:3400B imaging performance assessed from a customer perspective
Author(s): Friso Wittebrood; Guido Schiffelers; Colette Legein
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Paper Abstract

With the introduction of the NXE:3400B EUV scanner, ASML brings EUV lithography to the standards required for High Volume Manufacturing (HVM). In this presentation we will demonstrate the imaging performance of the NXE:3400B EUV scanner for customer representative use cases, based on the on-wafer imaging performance metrics CDU, local CDU and proximity matching. The use cases included in the imaging performance assessment are defined to cover single expose logic metal, logic block mask and DRAM contact hole applications.

Paper Details

Date Published: 3 October 2018
PDF: 13 pages
Proc. SPIE 10809, International Conference on Extreme Ultraviolet Lithography 2018, 1080905 (3 October 2018); doi: 10.1117/12.2503343
Show Author Affiliations
Friso Wittebrood, ASML Netherlands B.V. (Netherlands)
Guido Schiffelers, ASML Netherlands B.V. (Netherlands)
Colette Legein, ASML Netherlands B.V. (Netherlands)

Published in SPIE Proceedings Vol. 10809:
International Conference on Extreme Ultraviolet Lithography 2018
Kurt G. Ronse; Eric Hendrickx; Patrick P. Naulleau; Paolo A. Gargini; Toshiro Itani, Editor(s)

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