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Proceedings Paper

EUV pupil optimization for 32nm pitch logic structures
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Paper Abstract

A pupil optimization was carried out for the M2 layer of the imec N7 (foundry N5 equivalent) logic design. This is exposed as a single print EUV layer. We focused on the printability of the toughest parts of the design: a dense line space grating of 32 nm pitch and a tip-tip grating of 32 nm pitch, tip-to-tip target CD of 25 nm. We found that the pupil optimization can improve both the line space and the tip-to-tip gratings energy latitude and depth of focus. The tip-to-tip target CD can be pushed further, enabling further design scaling.

Paper Details

Date Published: 3 October 2018
PDF: 14 pages
Proc. SPIE 10809, International Conference on Extreme Ultraviolet Lithography 2018, 108090N (3 October 2018); doi: 10.1117/12.2503321
Show Author Affiliations
D. Rio, ASML (Belgium)
V. Blanco, IMEC (Belgium)
J.-H. Franke, IMEC (Belgium)
W. Gillijns, IMEC (Belgium)
M. Dusa, ASML Silicon Valley (United States)
E. De Poortere, ASML Belgium (Belgium)
P. Van Adrichem, ASML Netherlands B.V. (Netherlands)
K. Lyakhova, ASML Netherlands B.V. (Netherlands)
C. Spence, ASML Silicon Valley (United States)
E. Hendrickx, IMEC (Belgium)
S. Biesemans, Tokyo Electron Ltd. (Japan)
K. Nafus, Tokyo Electron Ltd. (Japan)

Published in SPIE Proceedings Vol. 10809:
International Conference on Extreme Ultraviolet Lithography 2018
Kurt G. Ronse; Eric Hendrickx; Patrick P. Naulleau; Paolo A. Gargini; Toshiro Itani, Editor(s)

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